Nanofabrication Revolution: Atomic Layer Deposition and Etching at the Nanoscale

DE

Autor*innen

• Johnson

Parameter

• 96 Seiten
• 4 Lesestunden

• Bauwesen & Statik

Mehr zum Buch

Focusing on the transformative techniques of Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE), this book reveals the precision of constructing structures at the atomic level. It explains the meticulous processes involved in adding or removing materials one atomic layer at a time. The applications are vast, spanning ultra-thin films for advanced transistors, intricate solar cell features, and medical implants. This exploration highlights the groundbreaking potential of nanofabrication, paving the way for future technological innovations.

• Sprache: Englisch
• Erscheinungsdatum: 2024
• Einband: Paperback